Metrology
Metrology capability
We offer a range of contact and non-contact metrology capability for in- and post-process characterisation and imaging.
Contact metrology
AFM - Veeco/Digital instruments Dimension D3100
• Nanoscope IVa controller.
• C-AFM extender module.
• C-AFM extender module.
Stylus profiler - KLA Alpha step IQ
• 20 mm or 400 mm vertical range.
• Linear surface profiles / roughness measurements.
• Step height, trench height or centre-biased measurements.
• ~ 15mg stylus force
• Linear surface profiles / roughness measurements.
• Step height, trench height or centre-biased measurements.
• ~ 15mg stylus force
Stylus profiler - KLA P7
• 150 mm chuck with motorized theta.
• 156 mm continuous scan length.
• Microhead-5 scan head offering:
- 0 - 1000 mm scan range.
- 0.5 – 50 mg (at constant force).
• 3D stress measurement capability.
• Programmable 1000-site acquisition.
• Side view optics.
• 156 mm continuous scan length.
• Microhead-5 scan head offering:
- 0 - 1000 mm scan range.
- 0.5 – 50 mg (at constant force).
• 3D stress measurement capability.
• Programmable 1000-site acquisition.
• Side view optics.
Non-contact metrology
Spectroscopic Ellipsometer - J A Woollam M2000XI
• 245nm to 1000nm (470 wavelengths)
• NIR extension from 1000 - 1690 nm (200 wavelengths).
• Rotating compensator allows simultaneous acquisition of all wavelengths.
• Automated stage including:
- Automated angle adjust (45° to 90°)
- Automated z height adjust
- Automated tip-tilt alignment.
- Computer controlled X-Y mapping (100 mm travel)
• Micro-spot optics configured for either:
- 27 mm working distance, short-axis spot dimension: 80 µm
- 40 mm working distance, short-axis spot dimension: 120 µm
• NIR extension from 1000 - 1690 nm (200 wavelengths).
• Rotating compensator allows simultaneous acquisition of all wavelengths.
• Automated stage including:
- Automated angle adjust (45° to 90°)
- Automated z height adjust
- Automated tip-tilt alignment.
- Computer controlled X-Y mapping (100 mm travel)
• Micro-spot optics configured for either:
- 27 mm working distance, short-axis spot dimension: 80 µm
- 40 mm working distance, short-axis spot dimension: 120 µm
Optical profiler - Filmetrics Profilm 3D
• Modes include:
- PSI for roughness measurement.
- White light for topographical measurement.
• Motorized 100 mm X-Y stage.
• Manual stage tip-tilt.
• Image stitching and colour mode capable.
• Objectives include:
- x5 (Michelson), x10, x20 and x50 (Mirau) lenses.
- PSI for roughness measurement.
- White light for topographical measurement.
• Motorized 100 mm X-Y stage.
• Manual stage tip-tilt.
• Image stitching and colour mode capable.
• Objectives include:
- x5 (Michelson), x10, x20 and x50 (Mirau) lenses.
FEG-SEM - Leo 1530
• 0.2 to 30 kV electron source.
• Resolution specification:
- 1.2 nm @ 20 kV.
- 2.5 nm @ 5 kV.
• Detection options include:
- Through Lens Detectors (@ <20 kV).
- Secondary electron detector (@ < 30 kV)
- Back-scattered electron detector (@ < 30 kV).
• Z-axis, tilt, rotation and X-Y stage movement available.
• Resolution specification:
- 1.2 nm @ 20 kV.
- 2.5 nm @ 5 kV.
• Detection options include:
- Through Lens Detectors (@ <20 kV).
- Secondary electron detector (@ < 30 kV)
- Back-scattered electron detector (@ < 30 kV).
• Z-axis, tilt, rotation and X-Y stage movement available.
Reflectometer - Thetametrisis FR-Pro D VIS/NIR
• 370 to 1700 nm spectrometer
• Spot sizes between 2 and 200 mm (lens aperture dependent)
• Objectives include:
- x5, x10, x20, x50 lenses.
• 100 mm X-Y motorized stage with 5 µm accuracy.
• Liquid cell for development studies
- Limited to maximum 30 x 30 mm sample size.
• Spot sizes between 2 and 200 mm (lens aperture dependent)
• Objectives include:
- x5, x10, x20, x50 lenses.
• 100 mm X-Y motorized stage with 5 µm accuracy.
• Liquid cell for development studies
- Limited to maximum 30 x 30 mm sample size.
Optical microscopes
• Nikon Eclipse LV100ND reflection microscope with brightfield and darkfield imaging.
- Lenses include: x100, x50, x20, x10
• Nikon Eclipse LV100ND reflection microscope with brightfield, darkfield and DIC imaging.
- Lenses include: x150, x100, x50, x20, x10
• Carl Zeiss Axio-Imager A1m reflection microscope with imaging software.
- Lenses include: x100, x50, x20, x10, x5
• ×4 other reflection / transmission microscopes for e.g. etch, development, device inspection.
• ×2 binocular microscopes for low-magnification inspection.
- Lenses include: x100, x50, x20, x10
• Nikon Eclipse LV100ND reflection microscope with brightfield, darkfield and DIC imaging.
- Lenses include: x150, x100, x50, x20, x10
• Carl Zeiss Axio-Imager A1m reflection microscope with imaging software.
- Lenses include: x100, x50, x20, x10, x5
• ×4 other reflection / transmission microscopes for e.g. etch, development, device inspection.
• ×2 binocular microscopes for low-magnification inspection.